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Plasma Etching: Fundamentals and Applications (Series on Semiconductor Science and Technology)

R 10,868

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Plasma Etching: Fundamentals and Applications (Series on Semiconductor Science and Technology)

This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.
Country USA
Brand OXFORD UNIVERSITY PRESS
Manufacturer Oxford University Press
Binding Hardcover
ItemPartNumber 2 colour plates, 5 halftones, numerous l
UnitCount 1
EANs 9780198562870
ReleaseDate 0000-00-00

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Country	USA
Brand	OXFORD UNIVERSITY PRESS
Manufacturer	Oxford University Press
Binding	Hardcover
ItemPartNumber	2 colour plates, 5 halftones, numerous l
UnitCount	1
EANs	9780198562870
ReleaseDate	0000-00-00